CARBON INCORPORATION IN METALORGANIC CHEMICAL VAPOR-DEPOSITION (AL,GA)AS FILMS GROWN ON (100), (311)A, AND (311)B ORIENTED GAAS SUBSTRATES

被引：37

作者：

TAMAMURA, K

OGAWA, J

AKIMOTO, K

MORI, Y

KOJIMA, C

机构：

来源：

APPLIED PHYSICS LETTERS | 1987年 / 50卷 / 17期

关键词：

D O I：

10.1063/1.97945

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1149 / 1151

页数：3

共 11 条

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