OBSERVATION OF SHEATH STRUCTURE NEAR A RF ELECTRODE IN A MAGNETIZED AFTERGLOW PLASMA

被引：9

作者：

OKUNO, Y ^{[1
]}

YAGURA, S ^{[1
]}

FUJITA, H ^{[1
]}

机构：

[1] NAGOYA UNIV,INST PLASMA PHYS,NAGOYA,AICHI 464,JAPAN

来源：

关键词：

D O I：

10.1063/1.342831

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2205 / 2208

页数：4

共 8 条

[1]

Bohm D, 1949, CHARACTERISTICS ELEC

[2]

Chen F F, 1965, PLASMA DIAGNOSTIC TE, P113

FUJITA, H ;

YAGURA, S .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1983, 22 (01) :148-151

GANGULY, BN ;

SHOEMAKER, JR ;

PREPPERNAU, BL ;

GARSCADDEN, A .

[5]

KUSHNER MJ, 1986, IEEE T PLASMA SCI, V14, P77

Langmuir, I ;

Compton, KT .

[7] INDUCTION-COUPLED PLASMA TORCH [J].

REED, TB .

[8] GLOW-DISCHARGE PHENOMENA IN PLASMA ETCHING AND PLASMA DEPOSITION [J].

VOSSEN, JL .