STRESS IN METAL LINES UNDER PASSIVATION - COMPARISON OF EXPERIMENT WITH FINITE-ELEMENT CALCULATIONS

被引：86

作者：

GREENEBAUM, B

SAUTER, AI

FLINN, PA

NIX, WD

机构：

[1] STANFORD UNIV,DEPT MAT SCI & ENGN,STANFORD,CA 94305

[2] INTEL CORP,SANTA CLARA,CA 95052

来源：

APPLIED PHYSICS LETTERS | 1991年 / 58卷 / 17期

关键词：

D O I：

10.1063/1.105075

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The elastic strain in Al-0.5% Cu metal lines under silicon nitride passivation has been determined by x-ray diffraction. The experimental stress tensor calculated from these strain values is in excellent agreement with the results of a finite element model calculation. The intrinsic stress in the dielectric plays no role in influencing the stress in the metal; only thermal stress effects are important.

引用

页码：1845 / 1847

页数：3

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