ION DAMAGE BUILDUP AND AMORPHIZATION PROCESSES IN ALXGA1-XAS

The nature of keV ion damage buildup and amorphization in Al xGa1-xAs at liquid-nitrogen temperature is investigated for various Al compositions using Rutherford backscattering channeling, transmission electron microscopy, and in situ time-resolved-reflectivity techniques. Two distinct damage buildup processes are observed in Al xGa1-xAs depending on Al content. At low Al content, the behavior is similar to GaAs whereby collisional disorder is "frozen in" and amorphization proceeds with increasing dose via the overlap of damage cascades and small amorphous zones created by individual ion tracks. However, some dynamic annealing occurs during implantation in AlGaAs and this effect is accentuated with increasing Al content. For high Al content, crystallinity is retained at moderate ion damage with disorder building up in the form of stacking faults, planar, and other extended defects. In the latter case, amorphization is nucleation limited and proceeds abruptly when the level of crystalline disorder exceeds a critical level. The amorphization threshold dose increases with increasing Al composition by over two orders of magnitude from GaAs to AlAs. Dynamic annealing and damage creation processes during implantation compete very strongly in AlxGa1-xAs even at liquid-nitrogen temperatures. This behavior is discussed in terms of both the availability of very fast mobile defects and bonding configurational changes related to the Al sublattice in AlxGa1-xAs of high Al content. © 1995 American Institute of Physics.