ELECTRON-MICROSCOPE STUDY OF ELECTRODEPOSITED NI FILMS IN 0.1-50 MU RANGE

被引：5

作者：

GUNDILER, I ^{[1
]}

MURR, LE ^{[1
]}

机构：

[1] NEW MEXICO INST MIN & TECHNOL,DEPT MET & MAT ENGN,SOCORRO,NM 87801

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 04期

关键词：

D O I：

10.1116/1.568666

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：762 / 765

页数：4

共 14 条

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[3]

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[4] MECHANISM OF STEP PROPAGATION AND PYRAMID FORMATION ON (100) PLANE OF COPPER FROM IN SITU NOMARSKI-OPTICAL STUDIES [J].

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[5] SURFACE STRUCTURE OF ELECTRODEPOSITED NICKEL [J].

HASHIMOT.K .

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[6] GROWTH AND STRUCTURE OF ELECTRODEPOSITED THIN METAL FILMS [J].

LAWLESS, KR .

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[7]

LAWLESS KR, 1960, P EUROPEAN REGIONAL, P396

[8]

MURR LE, 1970, ELECTRON OPTICAL APP

[9] ON THE TWIN STRUCTURE OF NICKEL FILMS ELECTRODEPOSITED ON SINGLE CRYSTALS OF COPPER [J].

OGAWA, S ;

MIZUNO, J ;

WATANABE, D ;

FUJITA, FE .

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[10]

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