SOLID-STATE REACTION IN THIN-FILMS OF THE CU-SB BINARY-SYSTEM

被引:7
作者
HALIMI, R [1 ]
HAMANA, D [1 ]
CHPILEVSKI, EM [1 ]
机构
[1] VI LENIN STATE UNIV,DEPT SOLID STATE PHYS,MINSK,BELORUSSIA,USSR
关键词
ANTIMONY AND ALLOYS - Thin Films - ELECTRONS - Diffraction - INTERMETALLICS - X-RAY ANALYSIS;
D O I
10.1016/0040-6090(86)90333-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The formation kinetics of intermetallic compounds in Cu/Sb thin films in the temperature range 473-623 K is studied by X-ray and electron diffraction. It is established that the Cu//2Sb phase begins to form during the deposition of the second layer. In the range 473-573 K, independently of film composition, only the Cu//2Sb phase forms and grows, even though the equilibrium diagram predicts two (Cu//2Sb and Cu//9Sb//2). During an annealing at 623 K of as-evaporated samples, in a first reaction stage both the Cu//2Sb and the Cu//9Sb//2 phases appear simultaneously whatever the film composition. Then the Cu//2Sb changes completely to the Cu//9Sb//2 phase if N//C//u greater than N//S//b, whereas both phases always coexist if N//S//b greater than N//C//u.
引用
收藏
页码:147 / 155
页数:9
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