NONEQUILIBRIUM MODELING OF LOW-PRESSURE ARGON PLASMA JETS .1. LAMINAR-FLOW

被引：35

作者：

CHANG, CH ^{[1
]}

PFENDER, E ^{[1
]}

机构：

[1] UNIV MINNESOTA,DEPT MECH ENGN,MINNEAPOLIS,MN 55455

来源：

PLASMA CHEMISTRY AND PLASMA PROCESSING | 1990年 / 10卷 / 03期

关键词：

ionization (chemical) nonequilibrium; Low-pressure; plasma jets; twotemperature;

D O I：

10.1007/BF01447204

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

This paper presents a modeling attempt related to low-pressure plasma spraying processes which find increasing applications for materials processing. After a review of the various models for ionization and recombination processes, a two-temperature model for argon plasmas in chemical (ionization) nonequilibrium is established using finite rate chemistry. Results of sample calculations manifest departures from kinetic as well as chemical equilibrium, demonstrating that the conventional models based on the LTE (local thermodynamic equilibrium) assumption cannot provide proper prediction for low-pressure plasma jets. © 1990 Plenum Publishing Corporation.

引用

页码：473 / 491

页数：19

共 51 条

[1] PARTICLE PLASMA INTERACTIONS DURING LOW-PRESSURE PLASMA DEPOSITION [J].