FLUX PINNING AND CRITICAL CURRENT-DENSITY OF A Y1BA2CU3O7-X SUPERCONDUCTING THIN-FILM

被引：19

作者：

MATSUURA, T

ITOZAKI, H

机构：

[1] Basic High Technology Laboratories, Sumitomo Electric Ind., Ltd., Itami, Hyogo 664

来源：

APPLIED PHYSICS LETTERS | 1991年 / 59卷 / 10期

关键词：

D O I：

10.1063/1.105514

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The relation between the critical current density and the pinning potential of an epitaxial Y1Ba2Cu3O7-x thin film was investigated. The pinning potential was evaluated from the temperature dependence of the resistivity in various values of a magnetic field. The pinning potential was inversely proportional to the applied magnetic field and had the anisotropy in the direction of the magnetic field. Critical current density of the thin film was calculated using the obtained pinning potential. This calculated result was consistent with the critical current density measured by a four-probe method.

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页码：1236 / 1238

页数：3

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