PREFERENTIAL SPUTTERING OF TIC UNDER KEV AR+ION BOMBARDMENT - SIMULTANEOUS SPUTTERING ISS MEASUREMENT WITH HE+ AND AR+ IONS

被引:11
作者
KANG, HJ
MATSUDA, Y
SHIMIZU, R
机构
关键词
D O I
10.1016/0039-6028(83)90305-9
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
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页码:L500 / L504
页数:5
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