VIBRATIONAL-RELAXATION OF N2(C,UPSILON)-STATE IN N2 PULSED RF DISCHARGE - ELECTRON-IMPACT AND POOLING REACTIONS

被引:55
作者
DEBENEDICTIS, S
DILECCE, G
机构
[1] Centro di Studio per la Chimica dei Plasmi CNR, Dipartimento di Chimica Università di Bari, 70126 Bari
关键词
D O I
10.1016/0301-0104(94)00370-P
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The decay of DELTAv = - 2 band sequence of N2 Second Positive emission system has been investigated in a N2 rf pulsed 500 Hz post discharge in the pressure range 0.1-3 Torr. The intensity of each band head of the sequence has been used to infer the N2(C, epsilon' = 0-4) relative vibrational distribution. The shape of the distribution varies significantly with the post discharge time and the pressure. A population inversion in the levels 0-1 and 2-3 characterizes the distributions measured at post discharge times higher than 100 mus. The distributions at the various post discharge times have been fitted by a model which takes into account three processes for the (C, upsilon') excitation: the electron impact from (X, upsilon) states by fast electrons (a), from (A, w) state by slow electrons (b), and the pooling reaction N2 (A, w) + N2(A,w') (c). In the discharge the excitation is predominantly given by process (a). At 1 ms in the post discharge the electronic process (b) still survives, and, together with process (c), provides excitation to C state.
引用
收藏
页码:149 / 162
页数:14
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