INORGANIC-ION BEAM RESIST FOR ADDITIVE PLATING OF METALLIC INTERCONNECTS

被引：3

作者：

ESKILDSEN, SS

SORENSEN, G

机构：

来源：

关键词：

D O I：

10.1063/1.95775

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1101 / 1102

页数：2

相关论文

共 5 条

[1] SELF-CONFINED METALLIC INTERCONNECTS FOR VERY LARGE-SCALE INTEGRATION
BARTUR, M
NICOLET, MA
[J]. APPLIED PHYSICS LETTERS, 1984, 44 (02) : 263 - 264
[2] COHEN RL, 1977, Patent No. 4042730
[3] ESKILDSEN SS, 1985, NUCL INSTRUM M B MAR
[4] KREUZ JA, 1982, 25TH I INT PACK EL C
[5] AIF3 - A NEW VERY HIGH-RESOLUTION ELECTRON-BEAM RESIST
MURAY, A
ISAACSON, M
ADESIDA, I
[J]. APPLIED PHYSICS LETTERS, 1984, 45 (05) : 589 - 591