ALUMINUM FILMS PREPARED BY METAL ORGANIC LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION

被引：78

作者：

GREEN, ML

LEVY, RA

NUZZO, RG

COLEMAN, E

机构：

来源：

关键词：

D O I：

10.1016/0040-6090(84)90136-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：367 / 377

页数：11

共 16 条

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[5] COOKE MJ, 1982, SOLID STATE TECHNOL, V25, P62
[6] X-RAY STUDY OF CVD ALUMINUM THIN-FILMS DEPOSITED ON SILICON AND QUARTZ SUBSTRATES
FATU, D
MUSCALU, M
MOROSANU, CE
[J]. MATERIALS CHEMISTRY, 1980, 5 (01): : 19 - 28
[7] KERN W, 1978, THIN FILM PROCESSES, pCH2
[8] PRODUCTION OF ALUMINUM AND ALUMINUM COATINGS BY THERMAL-DECOMPOSITION OF ALUMINUM ALKYLS
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EVANS, JW
[J]. METALLURGICAL TRANSACTIONS B-PROCESS METALLURGY, 1980, 11 (02): : 225 - 232
[9] MAUS EH, 1961, TECH P AM ELECTROPLA, V48, P149
[10] PAPKE JA, 1967, 1967 P C CHEM VAP DE, P193