PHOTOYIELD SPECTROMICROSCOPY OF SILICON SURFACES USING MONOCHROMATIC SYNCHROTRON RADIATION

被引：60

作者：

TONNER, BP ^{[1
]}

HARP, GR ^{[1
]}

机构：

[1] UNIV WISCONSIN,SURFACE STUDIES LAB,MILWAUKEE,WI 53211

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 01期

关键词：

D O I：

10.1116/1.575760

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1 / 4

页数：4

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