COMPENSATED MOSFET DEVICES

被引:15
作者
KLAASSEN, FM
HES, W
机构
[1] Philips Research Lab, Eindhoven, Neth, Philips Research Lab, Eindhoven, Neth
关键词
ELECTRIC CONDUCTIVITY - Analysis;
D O I
10.1016/0038-1101(85)90096-6
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The turn-on and conduction mechanisms of a p-channel compensated MOSFET are discussed. Depending on the implantation and back-bias conditions, two distinct modes of operation occur, each with its own characteristic threshold voltage and conductance relations. In addition, major factors influencing punch-through and the associated subthreshold characteristics have been taken into account. The effect of inversion in the compensating p-layer on the gate capacitance is shown. Experimental data verify the theoretical results presented. Consequences of typical device properties for CMOS modeling are discussed.
引用
收藏
页码:359 / 373
页数:15
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