THERMAL-STABILITY OF HAFNIUM AND TITANIUM NITRIDE DIFFUSION-BARRIERS IN MULTILAYER CONTACTS TO SILICON

被引：82

作者：

SUNI, I ^{[1
]}

MAENPAA, M ^{[1
]}

NICOLET, MA ^{[1
]}

LUOMAJARVI, M ^{[1
]}

机构：

[1] UNIV HELSINKI,DEPT PHYS,SF-00170 HELSINKI 17,FINLAND

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 05期

关键词：

D O I：

10.1149/1.2119920

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1215 / 1218

页数：4

共 17 条

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VONSEEFELD, H ;

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HO, F ;

ILES, P .

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[3]

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[4]

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[5]

FOURNIER PR, 1975, Patent No. 3879746

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[7] COMPRESSIVE STRESS TRANSITION IN AL, V, ZR, NB AND W METAL-FILMS SPUTTERED AT LOW WORKING PRESSURES [J].

HOFFMAN, DW ;

THORNTON, JA .

THIN SOLID FILMS, 1977, 45 (02) :387-396

[8] INTERNAL-STRESS IN ALUMINUM-OXIDE, TITANIUM CARBIDE AND COPPER-FILMS OBTAINED BY PLANAR MAGNETRON SPUTTERING [J].

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KONDO, M .

THIN SOLID FILMS, 1981, 78 (01) :41-47

[9]

Maenpaa M., 1981, Fifteenth IEEE Photovoltaic Specialists Conference - 1981, P518

[10]

MAENPAA M, 1980, THIN FILM INTERFACES, P316

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