DEVELOPMENT OF TANTALUM PENTOXIDE COATINGS BY CHEMICAL-VAPOR-DEPOSITION

被引:12
作者
GRAHAM, DW
STINTON, DP
机构
[1] Oak Ridge National Laboratory, Oak Ridge, Tennessee
关键词
D O I
10.1111/j.1151-2916.1994.tb04597.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Thermochemical considerations clearly indicate a need for the protection of SiC and Si3N4 materials from HCl- and Na2SO4 induced corrosion. Ta2O5 has been identified as a material which may be suitable for such a protective coating. Thermodynamic calculations have indicated a range of temperatures, pressures, and reactant concentrations under which Ta2O5 coatings may be formed as a single phase by chemical vapor deposition. Ta2O5 coatings exhibiting a range of microstructures were obtained experimentally.
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页码:2298 / 2304
页数:7
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