CS DEPOSITION ON LAYERED 2H TASE2 (0001) SURFACES - ADSORPTION OR INTERCALATION

被引：48

作者：

PETTENKOFER, C ^{[1
]}

JAEGERMANN, W ^{[1
]}

SCHELLENBERGER, A ^{[1
]}

HOLUBKRAPPE, E ^{[1
]}

PAPAGEORGOPOULOS, CA ^{[1
]}

KAMARATOS, M ^{[1
]}

PAPAGEORGOPOULOS, A ^{[1
]}

机构：

[1] UNIV IOANNINA,DEPT PHYS,GR-45110 IOANNINA,GREECE

来源：

SOLID STATE COMMUNICATIONS | 1992年 / 84卷 / 09期

关键词：

D O I：

10.1016/0038-1098(92)90459-M

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

Cs was adsorbed at room temperature (RT) and at low temperature (140 K, LT) onto cleaved 2H TaSe2 van der Waals surfaces. At LT a Cs overlayer is formed. Cs is intercalated at RT after an initial adsorption stage. The intercalation results in changes of the Ta 4f asymmetric lineshapes and in a broadening of the Ta 5d(z)2 emission at the Fermi edge which is interpreted in terms of the rigid band model of intercalation.

引用

页码：921 / 926

页数：6

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