EFFECTS OF WET CLEANING ON SI CONTAMINATED WITH HEAVY-METALS DURING REACTIVE ION ETCHING

被引：18

作者：

HOSOYA, T

OZAKI, Y

HIRATA, K

机构：

来源：

关键词：

D O I：

10.1149/1.2113595

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2436 / 2439

页数：4

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[7]

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