SURFACE ROTATIONAL PHONONS ON THE CLEAVAGE FACES OF TETRAHEDRALLY COORDINATED COMPOUND SEMICONDUCTORS

被引：12

作者：

DUKE, CB ^{[1
]}

WANG, YR ^{[1
]}

机构：

[1] XEROX CORP, WEBSTER RES CTR, WEBSTER, NY 14580 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 04期

关键词：

D O I：

10.1116/1.584795

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1027 / 1030

页数：4

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