ANISOTROPIC ETCHING OF SILICON - A MODEL DIFFUSION-CONTROLLED REACTION

[1] PHOTOETCHING OF NARROW DEEP SLOTS FOR STYLUS WEAR STANDARDS [J]. PRECISION ENGINEERING-JOURNAL OF THE AMERICAN SOCIETY FOR PRECISION ENGINEERING, 1980, 2 (04): : 177 - 182

[2] ALLEN DM, 1979, J PHOTOGR SCI, V27, P181

[3] UMOS TRANSISTORS ON (110) SILICON [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (05) : 907 - 914

[4] ANISOTROPIC ETCHING OF SILICON [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1978, 25 (10) : 1185 - 1193

[5] BOHIGIAN TA, 1980, J ELECTROCHEM SOC, V127, P212

[6] GASTON PJ, 1964, CARE HANDLING DISPOS

[7] GIBSON AG, 1965, PROGR SEMICONDUCTORS, V19

[8] GOOSEN G, 1976, INTERFINISH 76

[9] HUFF RF, 1973, ANISOTROPIC ETCHING

[10] ETCHING VERY NARROW GROOVES IN SILICON [J]. APPLIED PHYSICS LETTERS, 1975, 26 (04) : 195 - 198

[1] PHOTOETCHING OF NARROW DEEP SLOTS FOR STYLUS WEAR STANDARDS [J]. PRECISION ENGINEERING-JOURNAL OF THE AMERICAN SOCIETY FOR PRECISION ENGINEERING, 1980, 2 (04): : 177 - 182

[2] ALLEN DM, 1979, J PHOTOGR SCI, V27, P181

[3] UMOS TRANSISTORS ON (110) SILICON [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (05) : 907 - 914

[4] ANISOTROPIC ETCHING OF SILICON [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1978, 25 (10) : 1185 - 1193

[5] BOHIGIAN TA, 1980, J ELECTROCHEM SOC, V127, P212

[6] GASTON PJ, 1964, CARE HANDLING DISPOS

[7] GIBSON AG, 1965, PROGR SEMICONDUCTORS, V19

[8] GOOSEN G, 1976, INTERFINISH 76

[9] HUFF RF, 1973, ANISOTROPIC ETCHING

[10] ETCHING VERY NARROW GROOVES IN SILICON [J]. APPLIED PHYSICS LETTERS, 1975, 26 (04) : 195 - 198