CHARACTERIZATION OF SPIN-ON-GLASS USING FOURIER-TRANSFORM INFRARED-SPECTROSCOPY

被引：27

作者：

WOO, MP

CAIN, JL

LEE, CO

机构：

[1] Motorola Incorporated, Advanced Products Research, Development Laboratories, Austin

[2] VLSI Technology Incorporated, San Antonio

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1990年 / 137卷 / 01期

关键词：

D O I：

10.1149/1.2086361

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Spin-on-glass (SOG) has been characterized using process control techniques that provide in-line monitoring capability. Film composition changes have been observed for different anneal temperatures (300°-1000°C) and ambients (oxygen. and nitrogen). Fourier transform infrared (FTIR) spectroscopy and x-ray photoelectron spectroscopy (XPS) show a reduction in organic content in the film after annealing at temperatures above 500°C. Area integration under the silicon dioxide peak in the FTIR spectrum indicates compositional changes begin at a critical temperature identified as approximately 500°C. Both FTIR and XPS data show further densification of SOG takes place at higher temperature anneals (700°-1000°C). Refractive index and film stress measurement data correlate well with FTIR and XPS results. © 1990, The Electrochemical Society, Inc. All rights reserved.

引用

页码：196 / 200

页数：5

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