ELECTRON-BEAM LITHOGRAPHY WITH MONOLAYERS OF ALKYLTHIOLS AND ALKYLSILOXANES

被引：99

作者：

LERCEL, MJ

REDINBO, GF

PARDO, FD

ROOKS, M

TIBERIO, RC

SIMPSON, P

CRAIGHEAD, HG

SHEEN, CW

PARIKH, AN

ALLARA, DL

机构：

[1] CORNELL UNIV,NATL NANOFABRICAT FACIL,ITHACA,NY 14853

[2] PENN STATE UNIV,DEPT MAT SCI,UNIVERSITY PK,PA 16802

[3] PENN STATE UNIV,DEPT CHEM,UNIVERSITY PK,PA 16802

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.587635

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：3663 / 3667

页数：5

共 38 条

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