DISTRIBUTION OF BORON-INDUCED DEFECTS IN SHALLOW DIFFUSED SURFACE LAYERS OF SILICON

被引：23

作者：

RUPPRECHT, H

SCHWUTTKE, GH

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1966年 / 37卷 / 07期

关键词：

D O I：

10.1063/1.1782140

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2862 / +

页数：1

共 21 条

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