LOW-ENERGY ELECTRON-DIFFRACTION DURING PULSED LASER ANNEALING - A TIME-RESOLVED SURFACE STRUCTURAL STUDY

被引：34

作者：

BECKER, RS

HIGASHI, GS

GOLOVCHENKO, JA

机构：

来源：

关键词：

D O I：

10.1103/PhysRevLett.52.307

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：307 / 310

页数：4

共 16 条

[1] AUSTON DH, 1979, AIP C P, V50
[2] TIME-RESOLVED MEASUREMENTS OF STIMULATED SURFACE POLARITON WAVE SCATTERING AND GRATING FORMATION IN PULSED-LASER-ANNEALED GERMANIUM
EHRLICH, DJ
BRUECK, SRJ
TSAO, JY
[J]. APPLIED PHYSICS LETTERS, 1982, 41 (07) : 630 - 633
[3] FULLEY G, 1972, INT TABLES XRAY CRYS, V3, P241
[4] HANEMAN D, 1975, SURFACE PHYSICS PHOS, P58
[5] GIGAHERTZ STROBOSCOPY WITH SCANNING ELECTRON-MICROSCOPE
HOSOKAWA, T
FUJIOKA, H
URA, K
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1978, 49 (09) : 1293 - 1299
[6] LARSON BC, 1983, APPL PHYS LETT, V42, P232
[7] LARSON BC, 1982, PHYS REV LETT, V48, P387
[8] LIU JM, 1982, APPL PHYS LETT, V41, P693
[9] RAMAN MEASUREMENT OF LATTICE TEMPERATURE DURING PULSED LASER-HEATING OF SILICON
LO, HW
COMPAAN, A
[J]. PHYSICAL REVIEW LETTERS, 1980, 44 (24) : 1604 - 1607
[10] LOWNDES DH, 1983, APPL PHYS LETT, V42, P258