ENHANCEMENT OF OUTPUT INTENSITY LIMIT OF SEMICONDUCTOR-LASERS BY CHEMICAL PASSIVATION OF MIRROR FACETS

被引:15
作者
YOO, JS [1 ]
LEE, HH [1 ]
ZORY, P [1 ]
机构
[1] UNIV FLORIDA,DEPT ELECT ENGN,GAINESVILLE,FL 32611
基金
美国国家科学基金会;
关键词
D O I
10.1109/68.79753
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Chemical treatment of the mirror facets of semiconductor lasers is used to reduce nonradiative recombination centers, thereby enhancing their peak output power capabilities. Treatment of the surface with P2S5-NH4OH coupled with washing by (NH4)2S can more than double the output intensity limit. However, the enhancement that can be obtained on a consistent basis is lower.
引用
收藏
页码:202 / 203
页数:2
相关论文
共 10 条