EFFECTIVE TEMPERATURE IN THE IMPACT SURFACE REGION DURING 100 KEV XE+ IMPLANTATION OF COPPER BARS

被引：8

作者：

GRATTON, LM ^{[1
]}

MIOTELLO, A ^{[1
]}

TOSELLO, C ^{[1
]}

机构：

[1] IST RICERCA SCI & TECNOL,I-38050 POVO,ITALY

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1985年 / 36卷 / 03期

关键词：

D O I：

10.1007/BF00624933

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：139 / 141

页数：3

共 15 条

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[3]

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[9]

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[10] THEORY OF SPUTTERING .I. SPUTTERING YIELD OF AMORPHOUS AND POLYCRYSTALLINE TARGETS [J].

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