INFRARED-EMISSION SPECTROSCOPY OF YO IN THE LASER ABLATION DEPOSITION PROCESS OF YBA2CU3O7-DELTA THIN-FILMS

被引：3

作者：

AHARONI, E

KOREN, G

OPPENHEIM, UP

机构：

[1] Physics Department, Technion-Israel Institute of Technology, Haifa

来源：

PHYSICA C | 1990年 / 171卷 / 1-2期

关键词：

D O I：

10.1016/0921-4534(90)90453-L

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Plume emission spectra in the infrared are reported under the conditions of laser ablation deposition of YBa2Cu3O7 thin films at the location of the substrates. Two prominent emission peaks of YO at 700 and 815 cm-1 were observed which correspond to the P and R branches of the electronically excited Δ states. No observable contribution to the infrared emission from the electronic ground state was found. It is suggested that the massive presence of electronically excited fragments at the surface of the growing film facilitates the in situ film deposition at substrate temperatures of 700 ̃°C which are significantly lower than the temperatures needed in post-annealed films ( 900 ̃°C). © 1990.

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页码：37 / 41

页数：5

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