BINARY AND MULTILEVEL DIFFRACTIVE LENSES WITH SUBMICROMETER FEATURE SIZES

被引：16

作者：

ZARSCHIZKY, H ^{[1
]}

STEMMER, A ^{[1
]}

MAYERHOFER, F ^{[1
]}

LEFRANC, G ^{[1
]}

GRAMANN, W ^{[1
]}

机构：

[1] SIEMENS AG,SEMICOND OPTOCOMPONENTS,D-93049 REGENSBURG,GERMANY

来源：

OPTICAL ENGINEERING | 1994年 / 33卷 / 11期

关键词：

MICROOPTICS; DIFFRACTIVE MICRO LENSES; LENS ARRAYS; CAD; E-BEAM LITHOGRAPHY; LASER-TO-FIBER COUPLING; OPTICAL CROSSTALK;

D O I：

10.1117/12.179886

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Binary and multilevel diffractive lenses with submicrometer feature sizes are realized on silicon and galliumphosphide wafers using CAD methods, direct write e-beam lithography, reactive ion etching, antireflection coating, and wafer dicing. Measurements prove aberration-free imaging and maximum diffraction efficiencies of 70% for lenses with high numerical aperture (NA) of 0.5. Comparisons to other miniature and micro-optical elements are carried out with respect to laser-to-single-mode-fiber coupling and show the competitive performance of the diffractive lenses. Arrays for 18-channel parallel receiver modules are fabricated in on-axis and off-axis versions. Optical crosstalk is estimated.

引用

页码：3527 / 3536

页数：10

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