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ELECTRICAL-CONDUCTION AND BREAKDOWN IN OXIDES OF POLYCRYSTALLINE SILICON AND THEIR CORRELATION WITH INTERFACE TEXTURE
被引:68
作者
:
HEIMANN, PA
论文数:
0
引用数:
0
h-index:
0
HEIMANN, PA
MURARKA, SP
论文数:
0
引用数:
0
h-index:
0
MURARKA, SP
SHENG, TT
论文数:
0
引用数:
0
h-index:
0
SHENG, TT
机构
:
来源
:
JOURNAL OF APPLIED PHYSICS
|
1982年
/ 53卷
/ 09期
关键词
:
D O I
:
10.1063/1.331540
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:6240 / 6245
页数:6
相关论文
共 18 条
[1]
ABBAS SA, 1976, ECS EXT ABSTR, V762, P842
[2]
EVIDENCE FOR SURFACE ASPERITY MECHANISM OF CONDUCTIVITY IN OXIDE GROWN ON POLYCRYSTALLINE SILICON
ANDERSON, RM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,DIV SYST PROD,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
IBM CORP,DIV SYST PROD,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
ANDERSON, RM
KERR, DR
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,DIV SYST PROD,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
IBM CORP,DIV SYST PROD,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
KERR, DR
[J].
JOURNAL OF APPLIED PHYSICS,
1977,
48
(11)
: 4834
-
4836
[3]
INTERFACE EFFECTS AND HIGH CONDUCTIVITY IN OXIDES GROWN FROM POLYCRYSTALLINE SILICON
DIMARIA, DJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
DIMARIA, DJ
KERR, DR
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
KERR, DR
[J].
APPLIED PHYSICS LETTERS,
1975,
27
(09)
: 505
-
507
[4]
CONDUCTION AND TRAPPING OF ELECTRONS IN HIGHLY STRESSED ULTRATHIN FILMS OF THERMAL SIO2
HARARI, E
论文数:
0
引用数:
0
h-index:
0
机构:
HUGHES AIRCRAFT CO,NEWPORT BEACH RES CTR,NEWPORT BEACH,CA 92663
HUGHES AIRCRAFT CO,NEWPORT BEACH RES CTR,NEWPORT BEACH,CA 92663
HARARI, E
[J].
APPLIED PHYSICS LETTERS,
1977,
30
(11)
: 601
-
603
[5]
HEIMANN P, UNPUB
[6]
CURRENT-FIELD CHARACTERISTICS OF OXIDES GROWN FROM POLYCRYSTALLINE SILICON
HU, C
论文数:
0
引用数:
0
h-index:
0
机构:
NATL SEMICOND CORP,SANTA CLARA,CA 95051
NATL SEMICOND CORP,SANTA CLARA,CA 95051
HU, C
SHUM, Y
论文数:
0
引用数:
0
h-index:
0
机构:
NATL SEMICOND CORP,SANTA CLARA,CA 95051
NATL SEMICOND CORP,SANTA CLARA,CA 95051
SHUM, Y
KLEIN, T
论文数:
0
引用数:
0
h-index:
0
机构:
NATL SEMICOND CORP,SANTA CLARA,CA 95051
NATL SEMICOND CORP,SANTA CLARA,CA 95051
KLEIN, T
LUCERO, E
论文数:
0
引用数:
0
h-index:
0
机构:
NATL SEMICOND CORP,SANTA CLARA,CA 95051
NATL SEMICOND CORP,SANTA CLARA,CA 95051
LUCERO, E
[J].
APPLIED PHYSICS LETTERS,
1979,
35
(02)
: 189
-
191
[7]
EXPERIMENTAL-OBSERVATIONS ON CONDUCTION THROUGH POLYSILICON OXIDE
HUFF, HR
论文数:
0
引用数:
0
h-index:
0
机构:
TEXAS INSTRUMENTS INC, HOUSTON, TX 77001 USA
TEXAS INSTRUMENTS INC, HOUSTON, TX 77001 USA
HUFF, HR
HALVORSON, RD
论文数:
0
引用数:
0
h-index:
0
机构:
TEXAS INSTRUMENTS INC, HOUSTON, TX 77001 USA
TEXAS INSTRUMENTS INC, HOUSTON, TX 77001 USA
HALVORSON, RD
CHIU, TL
论文数:
0
引用数:
0
h-index:
0
机构:
TEXAS INSTRUMENTS INC, HOUSTON, TX 77001 USA
TEXAS INSTRUMENTS INC, HOUSTON, TX 77001 USA
CHIU, TL
GUTERMAN, D
论文数:
0
引用数:
0
h-index:
0
机构:
TEXAS INSTRUMENTS INC, HOUSTON, TX 77001 USA
TEXAS INSTRUMENTS INC, HOUSTON, TX 77001 USA
GUTERMAN, D
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1980,
127
(11)
: 2482
-
2488
[8]
SILICON OXIDATION STUDIES - MORPHOLOGICAL ASPECTS OF THE OXIDATION OF POLYCRYSTALLINE SILICON
IRENE, EA
论文数:
0
引用数:
0
h-index:
0
IRENE, EA
TIERNEY, E
论文数:
0
引用数:
0
h-index:
0
TIERNEY, E
DONG, DW
论文数:
0
引用数:
0
h-index:
0
DONG, DW
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1980,
127
(03)
: 705
-
713
[9]
THERMAL OXIDATION OF POLYCRYSTALLINE SILICON FILMS
KAMINS, TI
论文数:
0
引用数:
0
h-index:
0
KAMINS, TI
MACKENNA, EL
论文数:
0
引用数:
0
h-index:
0
MACKENNA, EL
[J].
METALLURGICAL TRANSACTIONS,
1971,
2
(08):
: 2292
-
&
[10]
KERR DR, 1976, ECS EXT ABSTR, V762, P839
←
1
2
→
共 18 条
[1]
ABBAS SA, 1976, ECS EXT ABSTR, V762, P842
[2]
EVIDENCE FOR SURFACE ASPERITY MECHANISM OF CONDUCTIVITY IN OXIDE GROWN ON POLYCRYSTALLINE SILICON
ANDERSON, RM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,DIV SYST PROD,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
IBM CORP,DIV SYST PROD,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
ANDERSON, RM
KERR, DR
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,DIV SYST PROD,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
IBM CORP,DIV SYST PROD,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
KERR, DR
[J].
JOURNAL OF APPLIED PHYSICS,
1977,
48
(11)
: 4834
-
4836
[3]
INTERFACE EFFECTS AND HIGH CONDUCTIVITY IN OXIDES GROWN FROM POLYCRYSTALLINE SILICON
DIMARIA, DJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
DIMARIA, DJ
KERR, DR
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
KERR, DR
[J].
APPLIED PHYSICS LETTERS,
1975,
27
(09)
: 505
-
507
[4]
CONDUCTION AND TRAPPING OF ELECTRONS IN HIGHLY STRESSED ULTRATHIN FILMS OF THERMAL SIO2
HARARI, E
论文数:
0
引用数:
0
h-index:
0
机构:
HUGHES AIRCRAFT CO,NEWPORT BEACH RES CTR,NEWPORT BEACH,CA 92663
HUGHES AIRCRAFT CO,NEWPORT BEACH RES CTR,NEWPORT BEACH,CA 92663
HARARI, E
[J].
APPLIED PHYSICS LETTERS,
1977,
30
(11)
: 601
-
603
[5]
HEIMANN P, UNPUB
[6]
CURRENT-FIELD CHARACTERISTICS OF OXIDES GROWN FROM POLYCRYSTALLINE SILICON
HU, C
论文数:
0
引用数:
0
h-index:
0
机构:
NATL SEMICOND CORP,SANTA CLARA,CA 95051
NATL SEMICOND CORP,SANTA CLARA,CA 95051
HU, C
SHUM, Y
论文数:
0
引用数:
0
h-index:
0
机构:
NATL SEMICOND CORP,SANTA CLARA,CA 95051
NATL SEMICOND CORP,SANTA CLARA,CA 95051
SHUM, Y
KLEIN, T
论文数:
0
引用数:
0
h-index:
0
机构:
NATL SEMICOND CORP,SANTA CLARA,CA 95051
NATL SEMICOND CORP,SANTA CLARA,CA 95051
KLEIN, T
LUCERO, E
论文数:
0
引用数:
0
h-index:
0
机构:
NATL SEMICOND CORP,SANTA CLARA,CA 95051
NATL SEMICOND CORP,SANTA CLARA,CA 95051
LUCERO, E
[J].
APPLIED PHYSICS LETTERS,
1979,
35
(02)
: 189
-
191
[7]
EXPERIMENTAL-OBSERVATIONS ON CONDUCTION THROUGH POLYSILICON OXIDE
HUFF, HR
论文数:
0
引用数:
0
h-index:
0
机构:
TEXAS INSTRUMENTS INC, HOUSTON, TX 77001 USA
TEXAS INSTRUMENTS INC, HOUSTON, TX 77001 USA
HUFF, HR
HALVORSON, RD
论文数:
0
引用数:
0
h-index:
0
机构:
TEXAS INSTRUMENTS INC, HOUSTON, TX 77001 USA
TEXAS INSTRUMENTS INC, HOUSTON, TX 77001 USA
HALVORSON, RD
CHIU, TL
论文数:
0
引用数:
0
h-index:
0
机构:
TEXAS INSTRUMENTS INC, HOUSTON, TX 77001 USA
TEXAS INSTRUMENTS INC, HOUSTON, TX 77001 USA
CHIU, TL
GUTERMAN, D
论文数:
0
引用数:
0
h-index:
0
机构:
TEXAS INSTRUMENTS INC, HOUSTON, TX 77001 USA
TEXAS INSTRUMENTS INC, HOUSTON, TX 77001 USA
GUTERMAN, D
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1980,
127
(11)
: 2482
-
2488
[8]
SILICON OXIDATION STUDIES - MORPHOLOGICAL ASPECTS OF THE OXIDATION OF POLYCRYSTALLINE SILICON
IRENE, EA
论文数:
0
引用数:
0
h-index:
0
IRENE, EA
TIERNEY, E
论文数:
0
引用数:
0
h-index:
0
TIERNEY, E
DONG, DW
论文数:
0
引用数:
0
h-index:
0
DONG, DW
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1980,
127
(03)
: 705
-
713
[9]
THERMAL OXIDATION OF POLYCRYSTALLINE SILICON FILMS
KAMINS, TI
论文数:
0
引用数:
0
h-index:
0
KAMINS, TI
MACKENNA, EL
论文数:
0
引用数:
0
h-index:
0
MACKENNA, EL
[J].
METALLURGICAL TRANSACTIONS,
1971,
2
(08):
: 2292
-
&
[10]
KERR DR, 1976, ECS EXT ABSTR, V762, P839
←
1
2
→