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SURFACE-POTENTIAL AND SURFACE-STATE DENSITY IN ANODIZED GAAS MOS CAPACITORS
被引:34
作者
:
SHIMANO, A
论文数:
0
引用数:
0
h-index:
0
机构:
OSAKA UNIV, FAC ENGN, DEPT ELECTR, SUITA, OSAKA 565, JAPAN
OSAKA UNIV, FAC ENGN, DEPT ELECTR, SUITA, OSAKA 565, JAPAN
SHIMANO, A
[
1
]
MORITANI, A
论文数:
0
引用数:
0
h-index:
0
机构:
OSAKA UNIV, FAC ENGN, DEPT ELECTR, SUITA, OSAKA 565, JAPAN
OSAKA UNIV, FAC ENGN, DEPT ELECTR, SUITA, OSAKA 565, JAPAN
MORITANI, A
[
1
]
NAKAI, J
论文数:
0
引用数:
0
h-index:
0
机构:
OSAKA UNIV, FAC ENGN, DEPT ELECTR, SUITA, OSAKA 565, JAPAN
OSAKA UNIV, FAC ENGN, DEPT ELECTR, SUITA, OSAKA 565, JAPAN
NAKAI, J
[
1
]
机构
:
[1]
OSAKA UNIV, FAC ENGN, DEPT ELECTR, SUITA, OSAKA 565, JAPAN
来源
:
JAPANESE JOURNAL OF APPLIED PHYSICS
|
1976年
/ 15卷
/ 05期
关键词
:
D O I
:
10.1143/JJAP.15.939
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:939 / 940
页数:2
相关论文
共 6 条
[1]
GALLIUM ARSENIDE MOS TRANSISTORS
BECKE, H
论文数:
0
引用数:
0
h-index:
0
BECKE, H
HALL, R
论文数:
0
引用数:
0
h-index:
0
HALL, R
WHITE, J
论文数:
0
引用数:
0
h-index:
0
WHITE, J
[J].
SOLID-STATE ELECTRONICS,
1965,
8
(10)
: 813
-
&
[2]
SURFACE STATES AT STEAM-GROWN SILICON-SILICON DIOXIDE INTERFACES
BERGLUND, CN
论文数:
0
引用数:
0
h-index:
0
BERGLUND, CN
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1966,
ED13
(10)
: 701
-
+
[3]
NEW ANODIC NATIVE OXIDE OF GAAS WITH IMPROVED DIELECTRIC AND INTERFACE PROPERTIES
HASEGAWA, H
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV NEWCASTLE, DEPT ELECT & ELECTR ENGN, MERZ LABS, NEWCASTLE NE1 7RU, ENGLAND
UNIV NEWCASTLE, DEPT ELECT & ELECTR ENGN, MERZ LABS, NEWCASTLE NE1 7RU, ENGLAND
HASEGAWA, H
FORWARD, KE
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV NEWCASTLE, DEPT ELECT & ELECTR ENGN, MERZ LABS, NEWCASTLE NE1 7RU, ENGLAND
UNIV NEWCASTLE, DEPT ELECT & ELECTR ENGN, MERZ LABS, NEWCASTLE NE1 7RU, ENGLAND
FORWARD, KE
HARTNAGEL, HL
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV NEWCASTLE, DEPT ELECT & ELECTR ENGN, MERZ LABS, NEWCASTLE NE1 7RU, ENGLAND
UNIV NEWCASTLE, DEPT ELECT & ELECTR ENGN, MERZ LABS, NEWCASTLE NE1 7RU, ENGLAND
HARTNAGEL, HL
[J].
APPLIED PHYSICS LETTERS,
1975,
26
(10)
: 567
-
569
[4]
GAAS INVERSION-TYPE MIS TRANSISTORS
ITO, T
论文数:
0
引用数:
0
h-index:
0
机构:
TOKYO INST TECHNOL, DEPT ELECTR, OHOKAYAMA, MEGURO, TOKYO, JAPAN
TOKYO INST TECHNOL, DEPT ELECTR, OHOKAYAMA, MEGURO, TOKYO, JAPAN
ITO, T
SAKAI, Y
论文数:
0
引用数:
0
h-index:
0
机构:
TOKYO INST TECHNOL, DEPT ELECTR, OHOKAYAMA, MEGURO, TOKYO, JAPAN
TOKYO INST TECHNOL, DEPT ELECTR, OHOKAYAMA, MEGURO, TOKYO, JAPAN
SAKAI, Y
[J].
SOLID-STATE ELECTRONICS,
1974,
17
(07)
: 751
-
759
[5]
LAM YW, 1971, J PHYS D APPL PHYS, V4, P1370, DOI 10.1088/0022-3727/4/9/318
[6]
MIYAZAKI T, 1974, JPN J APPL PHYS PT 2, P44
←
1
→
共 6 条
[1]
GALLIUM ARSENIDE MOS TRANSISTORS
BECKE, H
论文数:
0
引用数:
0
h-index:
0
BECKE, H
HALL, R
论文数:
0
引用数:
0
h-index:
0
HALL, R
WHITE, J
论文数:
0
引用数:
0
h-index:
0
WHITE, J
[J].
SOLID-STATE ELECTRONICS,
1965,
8
(10)
: 813
-
&
[2]
SURFACE STATES AT STEAM-GROWN SILICON-SILICON DIOXIDE INTERFACES
BERGLUND, CN
论文数:
0
引用数:
0
h-index:
0
BERGLUND, CN
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1966,
ED13
(10)
: 701
-
+
[3]
NEW ANODIC NATIVE OXIDE OF GAAS WITH IMPROVED DIELECTRIC AND INTERFACE PROPERTIES
HASEGAWA, H
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV NEWCASTLE, DEPT ELECT & ELECTR ENGN, MERZ LABS, NEWCASTLE NE1 7RU, ENGLAND
UNIV NEWCASTLE, DEPT ELECT & ELECTR ENGN, MERZ LABS, NEWCASTLE NE1 7RU, ENGLAND
HASEGAWA, H
FORWARD, KE
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV NEWCASTLE, DEPT ELECT & ELECTR ENGN, MERZ LABS, NEWCASTLE NE1 7RU, ENGLAND
UNIV NEWCASTLE, DEPT ELECT & ELECTR ENGN, MERZ LABS, NEWCASTLE NE1 7RU, ENGLAND
FORWARD, KE
HARTNAGEL, HL
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV NEWCASTLE, DEPT ELECT & ELECTR ENGN, MERZ LABS, NEWCASTLE NE1 7RU, ENGLAND
UNIV NEWCASTLE, DEPT ELECT & ELECTR ENGN, MERZ LABS, NEWCASTLE NE1 7RU, ENGLAND
HARTNAGEL, HL
[J].
APPLIED PHYSICS LETTERS,
1975,
26
(10)
: 567
-
569
[4]
GAAS INVERSION-TYPE MIS TRANSISTORS
ITO, T
论文数:
0
引用数:
0
h-index:
0
机构:
TOKYO INST TECHNOL, DEPT ELECTR, OHOKAYAMA, MEGURO, TOKYO, JAPAN
TOKYO INST TECHNOL, DEPT ELECTR, OHOKAYAMA, MEGURO, TOKYO, JAPAN
ITO, T
SAKAI, Y
论文数:
0
引用数:
0
h-index:
0
机构:
TOKYO INST TECHNOL, DEPT ELECTR, OHOKAYAMA, MEGURO, TOKYO, JAPAN
TOKYO INST TECHNOL, DEPT ELECTR, OHOKAYAMA, MEGURO, TOKYO, JAPAN
SAKAI, Y
[J].
SOLID-STATE ELECTRONICS,
1974,
17
(07)
: 751
-
759
[5]
LAM YW, 1971, J PHYS D APPL PHYS, V4, P1370, DOI 10.1088/0022-3727/4/9/318
[6]
MIYAZAKI T, 1974, JPN J APPL PHYS PT 2, P44
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1
→