P-RELATED DEFECTS IN P-DOPED ALPHA-SI-H

被引：16

作者：

ISHII, N ^{[1
]}

KUMEDA, M ^{[1
]}

SHIMIZU, T ^{[1
]}

机构：

[1] KANAZAWA UNIV,FAC TECHNOL,DEPT ELECTR,KANAZAWA,ISHIKAWA 920,JAPAN

来源：

关键词：

D O I：

10.1016/0038-1098(85)90188-7

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

页码：543 / 546

页数：4

共 10 条

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