NIOBIUM-STRESS INFLUENCE ON NB/AL-OXIDE/NB JOSEPHSON-JUNCTIONS

被引:47
作者
KURODA, K
YUDA, M
机构
关键词
D O I
10.1063/1.341051
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:2352 / 2357
页数:6
相关论文
共 11 条
[1]   FABRICATION OF ALL-NB JOSEPHSON-JUNCTIONS USING OXIDIZED ZR OVERLAYERS [J].
ASANO, H ;
TANABE, K ;
KATOH, Y ;
MICHIKAMI, O .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1986, 25 (03) :L261-L263
[2]   HIGH-QUALITY REFRACTORY JOSEPHSON TUNNEL-JUNCTIONS UTILIZING THIN ALUMINUM LAYERS [J].
GURVITCH, M ;
WASHINGTON, MA ;
HUGGINS, HA .
APPLIED PHYSICS LETTERS, 1983, 42 (05) :472-474
[3]   SELECTIVE NIOBIUM ANODIZATION PROCESS FOR FABRICATING JOSEPHSON TUNNEL-JUNCTIONS [J].
KROGER, H ;
SMITH, LN ;
JILLIE, DW .
APPLIED PHYSICS LETTERS, 1981, 39 (03) :280-282
[4]   3.0 PS SWITCHING OPERATION IN ALL-NB JOSEPHSON LOGIC GATES [J].
KURODA, K ;
NAKANO, J ;
YUDA, M ;
UEKI, M .
ELECTRONICS LETTERS, 1987, 23 (04) :163-165
[5]  
KURODA K, 1986, 18TH C SOL STAT DEV, P443
[6]   STRAIN IN EVAPORATED NB THIN-FILMS [J].
MURAKAMI, M ;
YOGI, T .
JOURNAL OF APPLIED PHYSICS, 1985, 57 (02) :211-215
[7]   NB/AL-OXIDE/NB TUNNEL-JUNCTIONS FOR JOSEPHSON INTEGRATED-CIRCUITS [J].
NAKAGAWA, H ;
NAKAYA, K ;
KUROSAWA, I ;
TAKADA, S ;
HAYAKAWA, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1986, 25 (01) :L70-L72
[8]   ALL REFRACTORY JOSEPHSON TUNNEL-JUNCTIONS FABRICATED BY REACTIVE ION ETCHING [J].
SHOJI, A ;
KOSAKA, S ;
SHINOKI, F ;
AOYAGI, M ;
HAYAKAWA, H .
IEEE TRANSACTIONS ON MAGNETICS, 1983, 19 (03) :827-830
[9]   INTERNAL-STRESSES IN METALLIC-FILMS DEPOSITED BY CYLINDRICAL MAGNETRON SPUTTERING [J].
THORNTON, JA ;
TABOCK, J ;
HOFFMAN, DW .
THIN SOLID FILMS, 1979, 64 (01) :111-119
[10]   INTRINSIC STRESS OF MAGNETRON-SPUTTERED NIOBIUM FILMS [J].
WU, CT .
THIN SOLID FILMS, 1979, 64 (01) :103-110