AN IR STUDY ON THE STABILITY OF Y(DPM)3, BA(DPM)2 AND CU(CPM)2 FOR UV IRRADIATION

被引:27
作者
HARIMA, H [1 ]
OHNISHI, H [1 ]
HANAOKA, K [1 ]
TACHIBANA, K [1 ]
GOTO, Y [1 ]
机构
[1] MITSUBISHI ELECTR CO, MFG DEV LAB, AMAGASAKI, HYOGO 661, JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1991年 / 30卷 / 9A期
关键词
MOCVD; SPECTROSCOPY; IR ABSORPTION; SUPERCONDUCTOR; CHELATES; THIN FILM; BA(DPM)2; Y(DPM)3; CU(DPM)2;
D O I
10.1143/JJAP.30.1946
中图分类号
O59 [应用物理学];
学科分类号
摘要
Ultraviolet-irradiation effects at 3 approximately 8 eV (400 approximately 150 nm) have been studied for Y(DPM)3, Ba(DPM)2 and Cu (DPM)2 (DPM: dipivaloylmethane) metalorganic chelates which are commonly used for YBa2CuO7-x superconducting-film formation by metalorganic chemical vapor deposition (MOCVD). An IR spectral analysis shows that the chelate ring of Ba(DPM)2 is most senstively affected when irradiated in a 200 approximately 300 nm region through a pi-pi* transition of the ligand orbital, and Y(DPM)3 shows a similar, but much more modest reaction. On the contrary, Cu(DPM)2 is very stable for all the light sources used. Such a difference of stability is deeply related to the metal-oxygen bonding nature of these chelates.
引用
收藏
页码:1946 / 1955
页数:10
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