ELECTRICAL-RESISTIVITY AND HALL-EFFECT IN FE-ZR AMORPHOUS SPUTTERED FILMS

被引：36

作者：

FUKAMICHI, K ^{[1
]}

GAMBINO, RJ ^{[1
]}

MCGUIRE, TR ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF APPLIED PHYSICS | 1982年 / 53卷 / 03期

关键词：

D O I：

10.1063/1.330800

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：2310 / 2312

页数：3

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