MASK FABRICATION FOR PROJECTION ELECTRON-BEAM LITHOGRAPHY INCORPORATING THE SCALPEL TECHNIQUE

被引:41
作者
LIDDLE, JA [1 ]
HUGGINS, HA [1 ]
BERGER, SD [1 ]
GIBSON, JM [1 ]
WEBER, G [1 ]
KOLA, R [1 ]
JURGENSEN, CW [1 ]
机构
[1] UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1991年 / 9卷 / 06期
关键词
D O I
10.1116/1.585357
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The choice of mask materials and fabrication route for a projection electron-beam lithography system is subject to a variety of constraints. Some are encountered in most lithographic techniques, while some are unique to the scattering with angular limitation for projection electron lithography (SCALPEL) technique. We have developed methods for analyzing the performance of potential mask materials and constructions. These have been used to determine the composition of a prototype mask. Results from such a mask are presented.
引用
收藏
页码:3000 / 3004
页数:5
相关论文
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