DEPOSITION OF TANTALUM AND TANTALUM OXIDE BY SUPERIMPOSED RF AND D-C SPUTTERING

被引：20

作者：

VRATNY, F

机构：

来源：

关键词：

D O I：

10.1149/1.2426636

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：505 / &

共 24 条

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[4] DIELECTRIC THIN FILMS THROUGH RF SPUTTERING
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[5] FREISER RG, 1965, J ELECTROCHEM SOC, V113, P357
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[8] GOODMAN B, 1966, RADIO AMATEURS HANDB
[9] DETERMINATION OF OXYGEN, HYDROGEN, NITROGEN, ARGON, AND CARBON IN THIN FILMS BY FLASH DISCHARGE LAMP
GULDNER, WG
[J]. ANALYTICAL CHEMISTRY, 1963, 35 (11) : 1744 - &
[10] GULDNER WG, 1964, P ELECTRON COMPONETS, P9