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INVESTIGATION OF PHASE GROWTH KINETICS IN SYSTEM OF SI SINGLE-CRYSTALS AND 5 THIN-FILMS
被引:5
作者
:
FOMIN, BI
论文数:
0
引用数:
0
h-index:
0
机构:
ACAD SCI USSR,SEMICOND PHYS INST,NOVOSIBIRSK,USSR
ACAD SCI USSR,SEMICOND PHYS INST,NOVOSIBIRSK,USSR
FOMIN, BI
[
1
]
GERSHINSKII, AE
论文数:
0
引用数:
0
h-index:
0
机构:
ACAD SCI USSR,SEMICOND PHYS INST,NOVOSIBIRSK,USSR
ACAD SCI USSR,SEMICOND PHYS INST,NOVOSIBIRSK,USSR
GERSHINSKII, AE
[
1
]
CHEREPOV, EI
论文数:
0
引用数:
0
h-index:
0
机构:
ACAD SCI USSR,SEMICOND PHYS INST,NOVOSIBIRSK,USSR
ACAD SCI USSR,SEMICOND PHYS INST,NOVOSIBIRSK,USSR
CHEREPOV, EI
[
1
]
EDELMAN, FL
论文数:
0
引用数:
0
h-index:
0
机构:
ACAD SCI USSR,SEMICOND PHYS INST,NOVOSIBIRSK,USSR
ACAD SCI USSR,SEMICOND PHYS INST,NOVOSIBIRSK,USSR
EDELMAN, FL
[
1
]
机构
:
[1]
ACAD SCI USSR,SEMICOND PHYS INST,NOVOSIBIRSK,USSR
来源
:
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH
|
1976年
/ 36卷
/ 01期
关键词
:
D O I
:
10.1002/pssa.2210360168
中图分类号
:
T [工业技术];
学科分类号
:
08 ;
摘要
:
引用
收藏
页码:K89 / K91
页数:3
相关论文
共 3 条
[1]
INVESTIGATION OF REACTIVE DIFFUSION IN THIN-FILM SYSTEM CU-TI
GERSHINSKII, AE
论文数:
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引用数:
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h-index:
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机构:
ACAD SCI USSR,SEMICOND PHYS INST,NOVOSIBIRSK,USSR
ACAD SCI USSR,SEMICOND PHYS INST,NOVOSIBIRSK,USSR
GERSHINSKII, AE
KHOROMENKO, AA
论文数:
0
引用数:
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h-index:
0
机构:
ACAD SCI USSR,SEMICOND PHYS INST,NOVOSIBIRSK,USSR
ACAD SCI USSR,SEMICOND PHYS INST,NOVOSIBIRSK,USSR
KHOROMENKO, AA
CHEREPOV, EI
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ACAD SCI USSR,SEMICOND PHYS INST,NOVOSIBIRSK,USSR
ACAD SCI USSR,SEMICOND PHYS INST,NOVOSIBIRSK,USSR
CHEREPOV, EI
[J].
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH,
1975,
31
(01):
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[2]
KINETICS OF SILICIDE FORMATION BY THIN-FILMS OF V ON SI AND SIO2 SUBSTRATES
KRAUTLE, H
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0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
CALTECH,PASADENA,CA 91109
KRAUTLE, H
NICOLET, MA
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CALTECH,PASADENA,CA 91109
CALTECH,PASADENA,CA 91109
NICOLET, MA
MAYER, JW
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CALTECH,PASADENA,CA 91109
CALTECH,PASADENA,CA 91109
MAYER, JW
[J].
JOURNAL OF APPLIED PHYSICS,
1974,
45
(08)
: 3304
-
3308
[3]
FORMATION OF VANADIUM SILICIDES BY INTERACTIONS OF V WITH BARE AND OXIDIZED SI WAFERS
TU, KN
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引用数:
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机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
TU, KN
ZIEGLER, JF
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IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
ZIEGLER, JF
KIRCHER, CJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
KIRCHER, CJ
[J].
APPLIED PHYSICS LETTERS,
1973,
23
(09)
: 493
-
495
←
1
→
共 3 条
[1]
INVESTIGATION OF REACTIVE DIFFUSION IN THIN-FILM SYSTEM CU-TI
GERSHINSKII, AE
论文数:
0
引用数:
0
h-index:
0
机构:
ACAD SCI USSR,SEMICOND PHYS INST,NOVOSIBIRSK,USSR
ACAD SCI USSR,SEMICOND PHYS INST,NOVOSIBIRSK,USSR
GERSHINSKII, AE
KHOROMENKO, AA
论文数:
0
引用数:
0
h-index:
0
机构:
ACAD SCI USSR,SEMICOND PHYS INST,NOVOSIBIRSK,USSR
ACAD SCI USSR,SEMICOND PHYS INST,NOVOSIBIRSK,USSR
KHOROMENKO, AA
CHEREPOV, EI
论文数:
0
引用数:
0
h-index:
0
机构:
ACAD SCI USSR,SEMICOND PHYS INST,NOVOSIBIRSK,USSR
ACAD SCI USSR,SEMICOND PHYS INST,NOVOSIBIRSK,USSR
CHEREPOV, EI
[J].
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH,
1975,
31
(01):
: 61
-
70
[2]
KINETICS OF SILICIDE FORMATION BY THIN-FILMS OF V ON SI AND SIO2 SUBSTRATES
KRAUTLE, H
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
CALTECH,PASADENA,CA 91109
KRAUTLE, H
NICOLET, MA
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
CALTECH,PASADENA,CA 91109
NICOLET, MA
MAYER, JW
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH,PASADENA,CA 91109
CALTECH,PASADENA,CA 91109
MAYER, JW
[J].
JOURNAL OF APPLIED PHYSICS,
1974,
45
(08)
: 3304
-
3308
[3]
FORMATION OF VANADIUM SILICIDES BY INTERACTIONS OF V WITH BARE AND OXIDIZED SI WAFERS
TU, KN
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
TU, KN
ZIEGLER, JF
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
ZIEGLER, JF
KIRCHER, CJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
KIRCHER, CJ
[J].
APPLIED PHYSICS LETTERS,
1973,
23
(09)
: 493
-
495
←
1
→