PULSED LASER DEPOSITION AND FERROELECTRIC CHARACTERIZATION OF BISMUTH TITANATE FILMS

被引:134
作者
BUHAY, H [1 ]
SINHAROY, S [1 ]
KASNER, WH [1 ]
FRANCOMBE, MH [1 ]
LAMPE, DR [1 ]
STEPKE, E [1 ]
机构
[1] WESTINGHOUSE ADV TECHNOL DIV,BALTIORE,MD 21203
关键词
D O I
10.1063/1.105200
中图分类号
O59 [应用物理学];
学科分类号
摘要
Stoichiometric films of bismuth titanate, Bi4Ti3O12, have been grown for the first time by the technique of pulsed excimer laser deposition. Ferroelectric films were obtained at temperatures as low as 500-degrees-C on Si(100), MgO(110), and Pt-coated Si(100) substrates. Hysteresis measurements using a Pt-coated Si sample yielded a saturation polarization value of about 28-mu-C/cm2, consistent with a randomly oriented titanate film structure. A preliminary metal-insulator-semiconductor sandwich structure of the form Bi4Ti3O12-CaF2(100 angstrom)-Si was grown and used to examine polarization induced memory switching effects.
引用
收藏
页码:1470 / 1472
页数:3
相关论文
共 8 条
  • [1] SAENGER KL, 1990, MATER RES SOC SYMP P, V200, P115, DOI 10.1557/PROC-200-115
  • [2] FERROELECTRICITY IN BI4TI3O12 AND ITS SOLID SOLUTIONS
    SUBBARAO, EC
    [J]. PHYSICAL REVIEW, 1961, 122 (03): : 804 - &
  • [3] FERROELECTRIC FIELD-EFFECT MEMORY DEVICE USING BI4TI3O12 FILM
    SUGIBUCHI, K
    KUROGI, Y
    ENDO, N
    [J]. JOURNAL OF APPLIED PHYSICS, 1975, 46 (07) : 2877 - 2881
  • [4] PREPARATION AND EPITAXY OF SPUTTERED FILMS OF FERROELECTRIC BI4TI3O12
    TAKEI, WJ
    FORMIGONI, NP
    FRANCOMBE, MH
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1970, 7 (03): : 442 - +
  • [5] OPTIMIZATION OF EPITAXIAL QUALITY IN SPUTTERED FILMS OF FERROELECTRIC BISMUTH TITANATE
    TAKEI, WJ
    WU, SY
    FRANCOMBE, MH
    [J]. JOURNAL OF CRYSTAL GROWTH, 1975, 28 (02) : 188 - 198
  • [6] OBSERVATION OF 2 DISTINCT COMPONENTS DURING PULSED LASER DEPOSITION OF HIGH-TC SUPERCONDUCTING FILMS
    VENKATESAN, T
    WU, XD
    INAM, A
    WACHTMAN, JB
    [J]. APPLIED PHYSICS LETTERS, 1988, 52 (14) : 1193 - 1195
  • [7] WU WY, 1979, J APPL PHYS, V50, P4314
  • [8] LOW-TEMPERATURE PREPARATION OF HIGH-TC SUPERCONDUCTING THIN-FILMS
    WU, XD
    INAM, A
    VENKATESAN, T
    CHANG, CC
    CHASE, EW
    BARBOUX, P
    TARASCON, JM
    WILKENS, B
    [J]. APPLIED PHYSICS LETTERS, 1988, 52 (09) : 754 - 756