VULNERABILITY OF SPECKLE PHOTOGRAPHY TO LENS ABERRATIONS

被引：29

作者：

STETSON, KA ^{[1
]}

机构：

[1] UNITED TECHNOL RES CTR,INSTRUMENTAT LAB 81,E HARTFORD,CT 06108

来源：

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA | 1977年 / 67卷 / 11期

关键词：

D O I：

10.1364/JOSA.67.001587

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

收藏

页码：1587 / 1590

页数：4

相关论文

共 4 条

[1] DISPLACEMENT MEASUREMENT FROM DOUBLE-EXPOSURE LASER PHOTOGRAPHS
ARCHBOLD, E
ENNOS, AE
[J]. OPTICA ACTA, 1972, 19 (04): : 253 - &
[2] Ennos A E, 1975, TOPICS APPL PHYS, V9, P203
[3] REVIEW OF SPECKLE PHOTOGRAPHY AND INTERFEROMETRY
STETSON, KA
[J]. OPTICAL ENGINEERING, 1975, 14 (05) : 482 - 489
[4] PROBLEM OF DEFOCUSING IN SPECKLE PHOTOGRAPHY, ITS CONNECTION TO HOLOGRAM INTERFEROMETRY, AND ITS SOLUTIONS
STETSON, KA
[J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1976, 66 (11) : 1267 - 1271