A MODEL FOR THE DETERMINATION OF THE SOLID COMPOSITION OF TERNARY III-V AND II-VI METALORGANIC CHEMICAL VAPOR-DEPOSITION EPILAYERS

被引:9
作者
AMIR, N
FEKETE, D
NEMIROVSKY, Y
机构
[1] Kidron Microelectronics Research Center, Technion-Israel Institute of Technology
关键词
D O I
10.1063/1.346773
中图分类号
O59 [应用物理学];
学科分类号
摘要
A simple kinetic model for the metalorganic chemical vapor deposition growth of ternary III-V and II-VI epilayers denoted by AxC 1-xB, is presented. The model yields the relationship between the solid composition x of the epilayer and the gas-phase concentrations of the constituents in various limiting cases. The solid composition x is given by x=(1+α-1×CGMC/CG MA)-1 =[1+α-1(1-Z -1)]-1 where α is a fitting parameter determined by the process parameters, CGMA and CG MC are the gas-phase concentrations of the metalorganic sources of A and C, respectively. The gas-phase composition Z is defined by Z=C GMA/(CGMA +CG MC). The predictions of the model are compared with measured data. The data points are calculated with one fitting parameter α, indicating the validity of the model.
引用
收藏
页码:871 / 873
页数:3
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