RECENT APPLIED DEVELOPMENTS IN THE AMORPHOUS-SILICON FIELD

被引：14

作者：

SPEAR, WE

LECOMBER, PG

SNELL, AJ

GIBSON, RA

机构：

来源：

关键词：

D O I：

10.1016/0040-6090(82)90533-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：359 / 370

页数：12

共 42 条

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[7] FRITZSCHE H, 1977, 7TH P INT C AM LIQ S, P1
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SPEAR, WE
[J]. APPLIED PHYSICS, 1980, 21 (04): : 307 - 311
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