HIGH-YIELD MANUFACTURE OF VERY LOW THRESHOLD, HIGH-RELIABILITY, 1.30-MU-M BURIED HETEROSTRUCTURE LASER-DIODES GROWN BY METAL ORGANIC-CHEMICAL VAPOR-DEPOSITION

被引:19
作者
KRAKOWSKI, M
BLONDEAU, R
KAZMIERSKI, K
RAZEGHI, M
RICCIARDI, J
HIRTZ, P
DECREMOUX, B
机构
关键词
D O I
10.1109/JLT.1986.1074644
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1470 / 1474
页数:5
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