REAL-TIME FEEDBACK FOR SIDEWALL PROFILE CONTROL IN REACTIVE ION ETCHING

被引:9
作者
RASHAP, B
FREUDENBERG, J
ELTA, M
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1995年 / 13卷 / 03期
关键词
D O I
10.1116/1.579770
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
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页码:1792 / 1796
页数:5
相关论文
共 11 条
[1]   PLASMA-ETCHING - DISCUSSION OF MECHANISMS [J].
COBURN, JW ;
WINTERS, HF .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02) :391-403
[2]   OPTICAL-EMISSION SPECTROSCOPY OF REACTIVE PLASMAS - A METHOD FOR CORRELATING EMISSION INTENSITIES TO REACTIVE PARTICLE DENSITY [J].
COBURN, JW ;
CHEN, M .
JOURNAL OF APPLIED PHYSICS, 1980, 51 (06) :3134-3136
[3]  
ELTA M, 1993, UNPUB 1993 P AM CONT
[4]  
ELTA M, 1993, 1993 P SPIE S MICR P
[5]   LINE-PROFILE RESIST DEVELOPMENT SIMULATION TECHNIQUES [J].
JEWETT, RE ;
HAGOUEL, PI ;
NEUREUTHER, AR ;
VANDUZER, T .
POLYMER ENGINEERING AND SCIENCE, 1977, 17 (06) :381-384
[6]  
Ljung L., 2002, SYSTEM IDENTIFICATIO
[7]  
RASHAP BA, 1993, UNPUB 1993 P IEEE C
[8]  
RASHAP BA, IN PRESS IEEE T SEMI
[9]  
S?derstr?m T., 1989, SYSTEN IDENTIFICATIO
[10]  
Sze S.M., 1983, VLSI TECHNOLOGY, V2nd