HIGH-RATE REACTIVE SPUTTER DEPOSITION OF ZIRCONIUM DIOXIDE

被引：58

作者：

JONES, F

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 06期

关键词：

D O I：

10.1116/1.575479

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

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页码：3088 / 3097

页数：10

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