SUBSTRATE BIAS EFFECTS ON ELECTRON-MOBILITY IN SILICON INVERSION LAYERS AT LOW-TEMPERATURES

被引:59
作者
FOWLER, AB [1 ]
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
关键词
D O I
10.1103/PhysRevLett.34.15
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
引用
收藏
页码:15 / 17
页数:3
相关论文
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