Lithography by accelerated nanoparticle ions

被引：1

作者：

Gspann, J ^{[1
]}

机构：

[1] FORSCHUNGSZENTRUM KARLSRUHE,INST MIKROSTRUKTURTECH,D-76021 KARLSRUHE,GERMANY

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1995年 / 13卷 / 06期

关键词：

D O I：

10.1116/1.588036

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A nanoparticle lithography process for microstructuring surfaces is realized by eroding an area selectively through impacts of accelerated nanoparticle ions. With singly charged nanoparticles of 1000 carbon dioxide molecules, acceleration by 100 kV Leads to highly supersonic impacts which give rise to shock wave-induced craters in the target. First atomic force microscopy measurements after short-time bombardment are found to be in accordance with predicted crater radii of the order of several 10 nm. Prolonged erosion leads to pronounced smoothing of the eroded surfaces. (C) 1995 American Vacuum Society.

引用

页码：2618 / 2620

页数：3