ELECTRICAL CHARACTERIZATION OF SEMICONDUCTING DIAMOND THIN-FILMS AND SINGLE-CRYSTALS

被引:32
作者
VONWINDHEIM, JA
VENKATESAN, V
MALTA, DM
DAS, K
机构
[1] Electronic Materials Center, Kobe Steel USA, Inc., Research Triangle Park, 27709, NC
关键词
CHEMICAL VAPOR DEPOSITION; DIAMOND; ELECTRICAL PROPERTIES;
D O I
10.1007/BF02661667
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Naturally occurring semiconducting single crystal (type IIb) diamonds and boron doped polycrystalline thin films were characterized by differential capacitance-voltage and Hall effect measurements, as well as secondary ion mass spectroscopy (SIMS). Results for natural diamonds indicated that the average compensation for a type IIb diamond was approximately 17%. Mobilities for the natural crystals varied between 130 and 564 cm2/V.s at room temperature. The uncompensated dopant concentration obtained by C-V measurements (2.8 +/- 0.1 X 10(16) cm-3) was consistent with the atomic B concentration measured by SIMS performed on similar samples (3.0 +/- 1.5 x 10(16) cm-3). Measurement of barrier heights for three different metals (platinum, gold, and aluminum) found essentially the same value of 2.3 +/- 0.1 eV in each case, indicating that the Fermi level was pinned at the diamond surface. Polycrystalline semiconducting diamond thin films demonstrated a complex carrier concentration behavior as a function of dopant density. This behavior may be understood in terms of a grain boundary model previously developed for polycrystalline silicon, or by considering a combination of compensation and impurity band conduction effects. The highest mobility measured for a polycrystalline sample was 10 cm2/V.s, indicating that electrical transport in the polycrystalline material was significantly degraded relative to the single crystal samples.
引用
收藏
页码:391 / 398
页数:8
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