BIAXIAL MODULUS MEASUREMENT OF CHEMICAL VAPOR-DEPOSITED POLYCRYSTALLINE DIAMOND FILMS

The biaxial modulus of polycrystalline diamond (PCD) films deposited by microwave plasma assisted chemical vapor deposition on silicon substrates has been investigated. The amount of hydrogen incorporated in the PCD films is determined using Fourier transform infrared spectroscopy. Additional characterization of the PCD films is performed using x-ray diffraction, Raman spectroscopy, and scanning electron microscope analysis. Biaxial moduli of PCD films containing 0.9% and 0.3% hydrogen have been found to be 960 and 1177 GPa, respectively. Comparison with the biaxial modulus of 1228 GPa for a randomly oriented aggregate of bulk diamond is discussed.