DETERMINATION OF DEPTH DISTRIBUTION OF IMPLANTED HELIUM-ATOMS IN NIOBIUM BY RUTHERFORD BACKSCATTERING

被引:26
作者
ROTH, J [1 ]
BEHRISCH, R [1 ]
SCHERZER, BM [1 ]
机构
[1] EURATOM ASSOC,MAX PLANCK INST PLASMAPHYS,D-8046 GARCHING,WEST GERMANY
关键词
D O I
10.1063/1.1655342
中图分类号
O59 [应用物理学];
学科分类号
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页码:643 / 644
页数:2
相关论文
共 8 条
  • [1] HELIUM IMPLANTATION AND RE-EMISSION FROM NIOBIUM AT ELEVATED-TEMPERATURES
    BAUER, W
    MORSE, D
    [J]. JOURNAL OF NUCLEAR MATERIALS, 1972, 44 (03) : 337 - &
  • [2] RUTHERFORD BACKSCATTERING AS A TOOL TO DETERMINE ELECTRONIC STOPPING POWERS IN SOLIDS
    BEHRISCH, R
    SCHERZER, BM
    [J]. THIN SOLID FILMS, 1973, 19 (02) : 247 - 257
  • [3] Northcliffe L. S., 1970, NUCL DATA A, V7, P233
  • [4] ROTH J, 1974, 8 P S FUS TECHN NORD
  • [5] ROTH J, 1973, P INT C APPLICATIONS
  • [6] SPUTTERING AND BACKSCATTERING OF keV LIGHT IONS BOMBARDING RANDOM TARGETS.
    Weissmann, R.
    Sigmund, P.
    [J]. Radiation Effects, 1973, 19 (01): : 7 - 14
  • [7] THE STOPPING CROSS SECTION OF D2O ICE
    WENZEL, WA
    WHALING, W
    [J]. PHYSICAL REVIEW, 1952, 87 (03): : 499 - 503
  • [8] WHALING W, 1958, HANDB PHYSIK, V34, P193