ARTIFICIAL OXIDE BARRIERS FOR NBN TUNNEL-JUNCTIONS

被引：22

作者：

TALVACCHIO, J

GAVALER, JR

BRAGINSKI, AI

JANOCKO, MA

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1985年 / 58卷 / 12期

关键词：

D O I：

10.1063/1.336234

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4638 / 4642

页数：5

共 21 条

[1] NIOBIUM NITRIDE THIN-FILMS FOR USE IN JOSEPHSON-JUNCTIONS [J].

CUKAUSKAS, EJ ;

CARTER, WL ;

QADRI, SB ;

SKELTON, EF .

IEEE TRANSACTIONS ON MAGNETICS, 1985, 21 (02) :505-508

[2]

GAVALER JR, 1986, UNPUB ADV CRYOGENIC, V32

[3]

GREINER JH, 1974, J APPL PHYS, V45, P32, DOI 10.1063/1.1662979

[4] PREPARATION AND PROPERTIES OF NB JOSEPHSON-JUNCTIONS WITH THIN AL LAYERS [J].

GURVITCH, M ;

WASHINGTON, MA ;

HUGGINS, HA ;

ROWELL, JM .

IEEE TRANSACTIONS ON MAGNETICS, 1983, 19 (03) :791-794

[5]

GURVITCH M, 1984, ADV CRYOGEN ENG, V30, P509

[6] ION-BEAM OXIDATION OF NB-BASED JOSEPHSON-JUNCTIONS [J].

HERWIG, R .

ELECTRONICS LETTERS, 1980, 16 (22) :850-851

[7]

IGARASHI M, 1984, ADV CRYOGENIC ENG MA, V30, P535

[8]

IHARA H, 1984, ADV CRYOGENIC ENG MA, V30, P589

[9] HIGH-QUALITY SUB-MICRON NIOBIUM TUNNEL-JUNCTIONS WITH REACTIVE-ION-BEAM OXIDATION [J].

KLEINSASSER, AW ;

BUHRMAN, RA .

APPLIED PHYSICS LETTERS, 1980, 37 (09) :841-843

[10] X-RAY PHOTOEMISSION SPECTROSCOPY STUDY OF SURFACE OXIDATION OF NB/AL OVERLAYER STRUCTURES [J].

KWO, J ;

WERTHEIM, GK ;

GURVITCH, M ;

BUCHANAN, DNE .

APPLIED PHYSICS LETTERS, 1982, 40 (08) :675-677

← 1 2 3 →